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Leybold Z 550 ( Sputter-center for R&D )
Features
Sputter-down system, 4 cathodes PK 150 ( 150mm dia. ), cathodes with dia. =75mm and dia. =100mm possible by using adaption flanges.
3 cathodes PK 200 (200mm dia.) although possible or 2 cathodes PK150 and 2 cathodes PK200, both on opposite sides (180°).
Without loadlock. Optional semi-automatic load-lock available.
Substrate-table with 4 substrate positions.
Deposition mode static, dynamic or with oscillation.
Sputter mode RF/DC, with or without RF-Bias.
RF-etching.
Presputter-shutter available in different shapes.
PLC controlled. 40 Recipies can be stored from 120 programmable layer-types.
9"-terminal for visualisation.
Pumping system: D40B and TMP 450, load-lock D8B.
Optional, system can be upgraded using Simatic-S7 PLC and PC for process values, visualisation and datalogging.
please ask for more details
System Dimensions, Weight
Pictures Leybold Z550
home Z 590 Z 550 Z 590 upgraded Z 590 upgraded Z 590 upgraded
A 550 VZK refurbished Z 400 upgraded Z 550 upgraded Z 550 upgraded Target