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Pre-owned systems

Z 550 sputtering system with high chamber ( Sputtering system for R&D )

Features

Sputter-down system with 4-5 cathodes PK 150 ( 150mm dia. ), cathodes with dia. =75mm or dia. =100mm are although possible by using adaption flanges.

3 cathodes PK 200 (200mm dia.) although possible or 2 cathodes PK 150 and 2 cathodes PK 200, both on opposite sides (180°).

Sputter-etching

Optional: Semi-automatic, single-substrate load-lock or fully automatic magazine load-lock avail- able.

Sputter mode RF/DC, with or without RF-Bias.

Presputter-shutter available in different shapes.

PLC-controlled. 40 recipes collected from 120 layers can be stored.

9"-terminal for visualization.

Pumping system has to be equipped according to your wishes.

Optional, machine can be retrofitted using Simatic-S7 PLC, PC for process values and datalogging and 19"-TFT-monitor for visualization.

please ask for more details

System Dimensions, Weight

Pictures Z550 with high chamber

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