home Z 590 Z 550 Z 590 upgraded Z 590 upgraded Z 590 upgraded

A 550 VZK refurbished Z 400 upgraded Z 550 upgraded Z 550 upgraded Target

Pre-owned systems


Z 550 sputtering system with high chamber ( Sputtering system for R&D )


Features

Sputter-down system with 4-5 cathodes PK 150 ( 150mm dia. ), cathodes with dia. =75mm or dia. =100mm are although possible by using adaption flanges.

3 cathodes PK 200 (200mm dia.) although possible or 2 cathodes PK 150 and 2 cathodes PK 200, both on opposite sides (180).

Sputter-etching

Optional: Semi-automatic, single-substrate load-lock or fully automatic magazine load-lock avail- able.

Sputter mode RF/DC, with or without RF-Bias.

Presputter-shutter available in different shapes.

PLC-controlled. 40 recipes collected from 120 layers can be stored.

9"-terminal for visualization.

Pumping system has to be equipped according to your wishes.

Optional, machine can be retrofitted using Simatic-S7 PLC, PC for process values and datalogging and 19"-TFT-monitor for visualization.

please ask for more details


System Dimensions, Weight


Pictures Z550 with high chamber


home Z 590 Z 550 Z 590 upgraded Z 590 upgraded Z 590 upgraded

A 550 VZK refurbished Z 400 upgraded Z 550 upgraded Z 550 upgraded Target


back