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Finished projects

Z 590 - upgrated


Z 590 ( Cleanroom cathode-sputtering system for R&D and production )


The plant had a fully automatic loading system from company Genmark (USA). Since the service for this system no longer exists, the loading system has been upgraded to Server and Elevator developed by German company ( company name: ASYS ). The loading robot can act 6"and 8" wafers. The Kuhnke PLC 653-W was replaced by a Simatic S7-300 PLC. The visualization and data management process via a PC with a 19"-TFT-monitor. Relevant process data is logged in an Excel file. Furthermore, the complete vacuum measurement gauges have been replaced by new Pfeiffer vacuum gauges.

Features

Sputter-down system, 4 cathode positions PK 200 (dia. 200mm), 3 cathodes, 1 heater

Fully automatic load-lock system. - Adress for referenz is available.

Radial/axial-motion drive system for substrate table.

sputtering with RF/DC, with or without RF-bias.

RF-etching.

Pumping system: D65BCS and TMP 1000, Load-lock: D8B and TMP 151.


Pictures Z590


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